研究発表 - 中野　誠彦

Effect of electron and ion transport on the charge build-up of a microscopic structure exposed to plasma

J. Matsui,T. Makabe, N. Nakano

52th Annual Gaseous Electronics Conference （(5-8 October 1999,Norfolk, USA)） , 

1999年10月

, 

口頭発表（一般）

Simulation of Time Modulated Dual Frequency Capacitively-Coupled Plasmas

Nobuhiko Nakano, T. Makabe

52th Annual Gaseous Electronics Conference （(5-8 October 1999,Norfolk, USA)） , 

1999年10月

, 

口頭発表（一般）

Modeling of time modulated dual frequency capacitively coupled plasma

Nobuhiko Nakano and Toshiaki Makabe

14th International symposium on Plasma Chemistry （Prague, Czech Republic） , 

1999年08月

, 

口頭発表（一般）

2D images of two frequency capacitively coupled plasmas at VHF

T. Kitajima, Y. Takeo, N. Nakano, T. Makabe

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

Dependence of driving frequency on capacitively coupled plasma in CF4

S.Segawa, M.Kurihara, Nobuhiko Nakano, Toshiaki Makabe

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

RF plasma characteristics in a micro-cell in Xe by using RCT model

M. Kurihara, N. Nakano, T. Makabe

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

Influence of a low frequency bias voltage on a wafer in inductively coupled plasma

H. Kobayashi, N. Nakano, T. Makabe

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

Effect of electron and ion transport on the charge build-up of the microscopic structure in CCP etcher

J. Matsui, N. Nakano, T. Makabe

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

Three dimensional Space-resolved optical-emission spectroscopy in an inductively coupled CF4/Ar plasma

H. Hirata, K. Hioki, N. Nakano,Z. Petrovi'c, T. Makabe, S. Matsumura

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

2D Selfconsistent Simulation of a DC magnetron Discharge and Its Target Erosion Profile

K. Okazawa, N. Nakano, T. Makabe, E. Shidoji

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

Two dimensional profiles of a pulsed capacitively coupled plasma

Y. Takeo, T. Kitajima, N. Nakano, T. Makabe

51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas, 

1998年10月

, 

(19-22 October 1998, Maui, USA)

Toward Charging Free Plasma Processes: phase space modeling between pulsed plasma and microtrench

Toshiaki Makabe, Jun Matsui, Mari Shibata, Nobuhiko Nakano

3rd International Symposium on Plasma Process-Induced Damage, 

1998年06月

, 

(4-5 June 1998, Honolulu, USA)

Electron and Ion Transport in a charged micro-trench

Jun Matsui, Nobuhiko Nakano, and Toshiaki Makabe

The 193rd meeting of The Electrochemical Society,, 

1998年05月

, 

(3-8 May 1998, San Diego, USA)

Effect of pulse modulated plasma on a charge build-up of the microscopic structure

Jun Matsui, Nobuhiko Nakano, and Toshiaki Makabe

SYMPOSIUM on DRY PROCESS, 

1997年11月

, 

(11-13 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)85-90

Effect of pulsed plasma in reactive ion etcher

Mari Shibata, Jun Matsui, Nobuhiko Nakano, Toshiaki Makabe, and Moritaka Nakamura

SYMPOSIUM on DRY PROCESS, 

1997年11月

, 

(12-14 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)77-82

Modeling of two frequency capacitively-coupled plasma in Ar/CF4 gas mixture

Nobuhiko Nakano, Toshiaki Makabe

SYMPOSIUM on DRY PROCESS, 

1997年11月

, 

(11-13 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)223-228

Topographic Charging Model in an rf Capacitively Coupled Plasma by the Boltzmann Equation

Jun Matsui, Nobuhiko Nakano, Mari Shibata, and Toshiaki Makabe

American Vacuum Society 44th National Symposium, 

1997年10月

, 

(20-24 Oct 1997, San Jose, USA)

Plasma Characteristics of Two-Frequency-Operated-Plasma in Ar by Two-Dimensional Modeling

Nobuhiko Nakano, and Toshiaki Makabe

50th Annual Gaseous Electronics Conference, 

1997年10月

, 

(6-9 October 1997, Madison, USA)

Nonvolatile Particle Transport from Etched Surface in 2-D CCP Modeling

Masao Hasebe, Nobuhiko Nakano, and Toshiaki Makabe

50th Annual Gaseous Electronics Conference, 

1997年10月

, 

(6-9 October 1997, Madison, USA)

Electron Transport in CF4 by using DNP of the Boltzmann equation

Masaru Kurihara, Nobuhiko Nakano, and Toshiaki Makabe

50th Annual Gaseous Electronics Conference, 

1997年10月

, 

(6-9 October 1997, Madison, USA)